A single link to the first track to allow the export script to build the search page
  • Monday, May 19, 2014
  • Session 4A: Advanced Process Control (APC)

    First Time Right Deposition of embedded SiGe in new Products

    • Raymond Van Roijen, IBM ;
    • Meghan Linskey, IBM ;
    • Eric Harley, IBM ;
    • Alyssa Herbert, IBM ;
    • Mohammed Fayaz, IBM ;
    • Michael Brodfuehrer, IBM ;
    • Anda Mocuta, IBM ;
    • Michael Steigerwalt, IBM ;
    • Colleen Snavely, IBM

    Chamber Matching Across Multiple Dimensions: Utilizing Predictive Maintenance, Equipment Health Monitoring, Virtual Metrology and Run-To-Run Control

    • James Moyne, Applied Materials ;
    • Manjunath Yedatore, Applied Materials ;
    • Jimmy Iskandar, Applied Materials ;
    • Parris Hawkins, Applied Materials ;
    • John Scoville, Applied Materials

    FDC Run-to-Run Variation Monitoring for Sensor Level Diagnosis in Tool Condition Hierarchy

    • Jakey Blue, Ecole des Mines de Saint-Etienne, CMP Georges Charpak ;
    • Jacques Pinaton, STMicroelectronics ;
    • Agnès Roussy, Ecole des Mines de Saint-Etienne, CMP Georges Charpak